Edited by David Briggs and John T. Grant

[ISBN 1-901019-04-7]

Published in association with IM Publications

The ES book contains 31 chapters by internationally regarded experts.

The chapters are arranged into the following sections;

Perspectives and basic principles

Perspectives on XPS and AES
David Briggs and John T. Grant

XPS: Basic Principles, Spectral Features and Qualitative Analysis
David Briggs

AES: Basic Principles, Spectral Features and Qualitative Analysis
John T. Grant

Sample handling, instrumentation and beam effects

Specimen Preparation and Handling
Joseph Geller

XPS: Instrumentation and Performance
Ian W. Drummond

AES Instrumentation and Performance
Masato Kudo

Instrument Calibration for AES and XPS
Martin P. Seah

Analysing Insulators with XPS and AES
Michael A. Kelly

Beam Effects During AES and XPS Analysis
Don R. Baer, Dan J. Gaspar, Mark H. Engelhard and A.Scott Lea

Surface sensitivity

Electron Transport in Solids
Wolfgang S.M. Werner

Electron Attenuation Lengths
Shigeo Tanuma


Quantification of Nano-structures by Electron Spectroscopy
Sven Tougaard

Quantification in AES and XPS
Martin P. Seah

Spectral interpretation

The Use of Chemometrics in AES and XPS Data Treatment
William F. Stickle

XPS Lineshapes and Curve Fitting
Neal Fairley

Chemical Effects in XPS
Laszlo Kövér

Chemical Information from Auger Lineshapes
David E. Ramaker

The Auger Parameter
Giuliano Moretti

Valence Bands Studied by XPS
Peter M.A. Sherwood

Structural effects

Structural Effects in XPS and AES: Diffraction
J. Osterwalder

Electron Backscattering and Channelling
Ding Ze-jun and Ryuichi Shimizu

Depth profiling

Sputter Depth Profiling in AES and XPS
Thomas Wagner, Jiang Y. Wang and Siegfried Hofmann

Angle-Resolved X-Ray Photoelectron Spectroscopy
Peter J. Cumpson


XPS Imaging
Kateryna Artyushkova and Julia E. Fulghum

Processing, Interpretation and Quantification of Auger Images
Martin Prutton

Developing aspects

X-ray Photoelectron Spectroscopy and Imaging at Synchrotrons
G. Margaritondo

Total Reflection X-ray Photoelectron Spectroscopy
Yoshitoki Iijima

Ion-Excited Auger Electron Spectroscopy
John T. Grant

Positron-Annihilation-Induced Auger Electron Spectroscopy
Toshiyuki Ohdaira and Ryoichi Suzuki

Electron Coincidence Measurements
Stephen M. Thurgate

Recent Developments in the Theory of Auger Spectroscopy
Peter Weightman


  • Peak Positions from Mg X-Rays and from Al X-Rays by Atomic Number
  • Peak Positions from Mg X-Rays and from Al X-Rays in Numerical Order
  • Auger Kinetic Energies and Sensitivity Factors by Atomic Number
  • Auger Kinetic Energies in Numerical Order
  • Polymer C 1s Chemical Shifts
  • Comparing Beam Damage Rates Using Susceptibility Tables
    D.R. Baer, M.H. Engelhard, A.S. Lea and D.J. Gaspar
  • Manufacturers of AES and XPS Systems
    John T. Grant
  • Software for Processing AES and XPS Data
    John T. Grant
  • Databases
    John T. Grant
  • Measurement and Documentary Standards
    John T. Grant
  • Internet Resources
    John T. Grant

See also: